Stress and aging minimization in photoplastic AFM probes


AU: 
Martin, C.; Llobera, A.; Villanueva, G.; Voigt, A.; Gruetzner, G.; Brugger, J.; Perez-Murano, F.
SO: 
MICROELECTRONIC ENGINEERING
VL: 
86
BP: 
1226
EP: 
1229
PY: 
2009
SN: 
0167-9317
Impact: 
1.58
Año IF: 
2008
Resumen: 

Photostructurable epoxy based resists, like SU-8, are soft materials with a Young's Modulus around 4 GPa, which makes them particularly suitable as base material to fabricate Atomic Force Microscopy (AFM) probes for non-destructive analysis of fragile sam

DT: 
Article en revistes indexades
Percentil: 
MEDIUM
Año Percentil: 
2008
Categoría: 
ENGINEERING, ELECTRICAL & ELECTRONIC