Modeling of non-stoichiometric silicon oxides obtained by plasma enhanced chemical vapour deposition process


AU: 
Riera, M.; Rodriguez, J.A.; Barreto, J.; Dominguez, C.
SO: 
THIN SOLID FILMS
Autores del GTQ: 
VL: 
515
IS: 
07/08/11
BP: 
3380
EP: 
3386
PY: 
2007
SN: 
0040-6090
Impact: 
1.69
Año IF: 
2007
Resumen: 

Silicon oxides ranging from near stoichiometric to silicon rich silicon oxides can be obtained by plasma enhanced chemical vapour deposition from silane (SiH4) and nitrous oxide (N2O) Mixtures. During deposition, impurity bonds like Si-H and Si-OH incorpo

DT: 
Article en revistes indexades
Percentil: 
HIGH
Año Percentil: 
2007
Categoría: 
MATERIALS SCIENCE, COATINGS & FILMS