High-resolution technique for fabricating environmentally sensitive hydrogel microstructures


AU: 
Lei, M.; Gu, Y.; Baldi, A.; Siegel, R.A.; Ziaie, B.
SO: 
LANGMUIR
Autores del GTQ: 
VL: 
20
IS: 
21
BP: 
8947
EP: 
8951
PY: 
2004
SN: 
0743-7463
Impact: 
3.30
Año IF: 
2004
Resumen: 

This communication introduces a novel high-resolution technique for fabricating hydrogel microstructures using photoresist lithography and dry etching. This method alleviates the need for photoinitiators used in conventional approaches and is applicable t

DT: 
Article en revistes indexades
Percentil: 
HIGH
Año Percentil: 
2004
Categoría: 
CHEMISTRY, PHYSICAL