Fabrication and modeling of silicon-embedded high-Q inductors


AU: 
Pan, T.; Baldi, A.; Davies-Venn, E.; Drayton, R.F.; Ziaie, B.
SO: 
JOURNAL OF MICROMECHANICS AND MICROENGINEERING
Autores del GTQ: 
VL: 
15
IS: 
4
BP: 
849
EP: 
854
PY: 
2005
SN: 
0960-1317
Impact: 
2.50
Año IF: 
2005
Resumen: 

In this paper, we report on the fabrication and modeling of a CMOS-compatible silicon-embedded high-Q integrated inductor (mu H range). The fabrication process is based on DRIE, pulse-reverse super-conformal electroplating of copper and chemical-mechanica

DT: 
Article en revistes indexades
Percentil: 
HIGH
Año Percentil: 
2005
Categoría: 
INSTRUMENTS & INSTRUMENTATION