Comparative study between silicon-rich oxide films obtained by LPCVD and PECVD


AU: 
Morales, A.; Barreto, J.; Dominguez, C.; Riera, M.; Aceves, M.; Carrillo, J.
SO: 
PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES
Autores del GTQ: 
VL: 
38
IS: 
01/02/11
BP: 
54
EP: 
58
PY: 
2007
SN: 
1386-9477
Impact: 
0.83
Año IF: 
2007
Resumen: 

A comparative study of compositional and optical properties of silicon-rich oxide (SRO) films deposited by low-pressure chemical vapor deposition (LPCVD) and plasma-enhanced chemical vapor deposition (PECVD) is presented. Infrared spectra revealed the pre

DT: 
Article en revistes indexades
Percentil: 
LOW
Año Percentil: 
2007
Categoría: 
NANOSCIENCE & NANOTECHNOLOGY