Optical properties of silicon rich silicon oxides obtained by PECVD


AU: 
Diaz, B.; Rodriguez, J.A.; Riera, M.; Llobera, A.; Dominguez, C.; Tutor, J.
SO: 
MICROELECTRONICS JOURNAL
GTQ Authors: 
VL: 
35
IS: 
1
BP: 
65
EP: 
67
PY: 
2004
SN: 
0026-2692
Impact: 
0.48
Year IF: 
2004
Abstract: 

In this work optical properties of SiOx (0 < x < 2) layers obtained by plasma enhanced chemical vapor deposition are studied. Infrared spectra and refractive index dependences with the reactant gases flow ratio R are explained for as deposited, aged and t

DT: 
Article en revistes indexades
Percentil: 
LOW
Percentil Year: 
2004
Category: 
ENGINEERING, ELECTRICAL & ELECTRONIC