Method for defining and producing reactive chemical nanomemtric surface patterns by means of gaseous-phase soft lithography, resulting patterns and devices and uses thereof


Tipus: 
PCT
Num. Solicitut: 
WO2009ES70006
Data Solicitut: 
Dm, 2009-01-13 00:00
Num. Publicació: 
WO2009095520
Data Sol·licitud: 
Dijous, August 6, 2009 - 10:00
Inventor: 
DE LA RICA QUESADA ROBERTO [ES]; FERNANDEZ SANCHEZ CESAR [ES]; BALDI COLL ANTONIO [ES]; DOMINGUEZ HORNA CARLOS [ES]; JIMENEZ JORQUERA CECILIA [ES]
Sol·licitant: 
Consejo Superior de Investigaciones Científicas (CSIC)
Num. Prioritat: 
ES20080000221
Priority Date: 
Dimarts, January 29, 2008 - 10:00
Publication date: 
Dilluns, December 21, 2009 - 10:00
Estat: 
Agotada
Resum: 

The invention relates to a method for defining and producing patterns on wafers made from monocrystalline silicon or another semiconductive material or solid surface, said patterns comprising a pre-sprayed reactive chemical pattern or a series of patterns, preferably a silane molecule such as MPTMS and APTMS with an exposed thiol and amino functional group respectively. Said nanometric functionalised media can be used to produce microelectronic and biotechnological devices such as, for example, a PNA or DNA microchip or microarray.