Stress and aging minimization in photoplastic AFM probes
AU:
Martin, C.; Llobera, A.; Villanueva, G.; Voigt, A.; Gruetzner, G.; Brugger, J.; Perez-Murano, F.
SO:
MICROELECTRONIC ENGINEERING
VL:
86
BP:
1226
EP:
1229
PY:
2009
SN:
0167-9317
Impact:
1.58
Any IF:
2008
Resum:
Photostructurable epoxy based resists, like SU-8, are soft materials with a Young's Modulus around 4 GPa, which makes them particularly suitable as base material to fabricate Atomic Force Microscopy (AFM) probes for non-destructive analysis of fragile sam
DT:
Article en revistes indexades
Percentil:
MEDIUM
Any Percentil:
2008
Categoria:
ENGINEERING, ELECTRICAL & ELECTRONIC
